


	Dr. Joy Cheng Research Staff Member IBM Almaden Research Center & IBM Taiwan

Profile

Education: Ph.D. Materials Science and Engineering, MIT, USA

Experience: Research staff member, IBM Almaden research center

Abstract:

Extending Patterning Capability Using Directed Self-Assembly

Directed self-assembly (DSA) of polymers, which combines self-assembled polymers and lithographically-defined directing prepatterns, provides a material-based resolution enhancement technique to extend the patterning capability of lithography. These polymers offers feature dimension and uniformity which is difficult to achieve at the resolution limit or throughput limit of lithography. As a materials-based resolution enhancement technique, DSA has been used to augment the patterning capability of optical lithography, EUV lithography and E-beam lithography. Recently, DSA has been transitioned from experiments in the research labs to the feasibility evaluation at various pilot lines. Various DSA schemes such as frequency multiplications and pattern rectification have been demonstrated on 300mm wafers. In this paper, we will discuss the integration of DSA into standard lithography. DSA performance from both chemical epitaxy and graphoepitaxy is investigated and self-aligned ustomization schemes. To achieve good DSA performance, co-optimization of DSA materials, processes and directing prepatterns is required. Desired DSA patterns can be generated using well-designed directing prepatterns based on DSA model and design rules.