


	Dr. Douglas Guerrero Senior Technologist, Brewer Science

Profile
-Education •PhD in Organic Chemistry
-Experience
•Senior Technologist, Brewer Science •Over 50 publications and patents •Member of SPIE Advances in Resist Materials and Processing Technology committee •Served in the international advisory board of Conference of Photopolymer Science & Technology and SEMATECH Lithography Extension committee
Abstract:
Extending Lithography with Advanced Materials

The ITRS “Grand Challenges” are classified into two categories: “Enhancing Performance” and “Cost-Effective Manufacturing,” which are often translated as “faster, better, cheaper” products. To address these challenges, materials suppliers can approach them with an integrated product design methodology rather than unique products for the immediate challenges. With the continued delay of extreme ultraviolet (EUV) lithography, even more importance is placed on versatile material and process solutions designed to extend existing lithography technology. In this presentation, Brewer Science will outline this integrated product design methodology and its impact on the final customer process for a broad spectrum of lithography materials such as multipatterning, positive- and negative-tone develop (PTD and NTD), directed self-assembly (DSA), and EUV lithography. We will compare advantages of versatile product platforms over customized products and demonstrate how suppliers and semiconductor manufacturers can improve collaboration for mutual success.