Burn J. Lin is currently as head of the Nano-Patterning Technology Division for lithography and mask making at TSMC. He has been the president of Linnovation, Inc. since 1992. Prior to that, he held various technical and managerial positions in the field of microlitholgraphy at IBM. He has been extending the limit of optical lithography for more than one third century. Dr. Lin has published many book chapters, journal articles and patents. Among those, are the 1st articles in the following fields: deep-uv lithography, partial coherent imaging for 2D mask patterns, E-D tree for projection printing, E-G tree for x-ray proximity printing, multi-layer resist systems, resolution and DOF scaling equations, vibration in projection imagining, k1 reduction, electric contact hole measurement, optimum NA in projection printing, reduction of resist consumption by spray-and-spin in vapor, and Signamization.




	Dr. Burn J. Lin / 林本堅博士 R&D Vice President, TSMC Chairman, SEMI Taiwan IC Committee

Profile

Burn J. Lin is currently as head of the Nano-Patterning Technology Division for lithography and mask making at TSMC. He has been the president of Linnovation, Inc. since 1992. Prior to that, he held various technical and managerial positions in the field of microlitholgraphy at IBM. He has been extending the limit of optical lithography for more than one third century. Dr. Lin has published many book chapters, journal articles and patents. Among those, are the 1st articles in the following fields: deep-uv lithography, partial coherent imaging for 2D mask patterns, E-D tree for projection printing, E-G tree for x-ray proximity printing, multi-layer resist systems, resolution and DOF scaling equations, vibration in projection imagining, k1 reduction, electric contact hole measurement, optimum NA in projection printing, reduction of resist consumption by spray-and-spin in vapor, and Signamization.